We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Direct imaging equipment.
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Direct imaging equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies | IPROS GMS

Direct imaging equipment Product List

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Compact LED Direct Drawing Device "Micro Writer ML Family"

Compact LED Direct Drawing Device "Micro Writer ML Family"

Compact tabletop! A maskless LED direct drawing device that enables high-speed pattern prototyping.

The "Micro Writer ML Family" from Japan Quantum Design is a compact, desktop LED direct drawing device that enables high-speed pattern prototyping without the need for masks. It allows for quick prototyping of small patterns without the hassle of creating masks each time a pattern is made. It is capable of directly drawing on photoresist using LEDs. 【Features】 ■ Compact desktop size (base area 70cm x 60cm) ■ Enables high-speed pattern prototyping ■ Eliminates the need for mask creation each time ■ Capable of direct LED drawing on photoresist *For more details, please refer to the PDF materials or feel free to contact us.

  • Other processing machines
  • Other semiconductor manufacturing equipment
  • Direct imaging equipment

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Laser Direct Writing Device "DWL 66+"

Laser Direct Writing Device "DWL 66+"

High-performance laser lithography equipment for research and development.

The "DWL 66+" is a high-resolution laser direct writing system suitable for research and development applications, small lot production, mask creation, and maskless exposure. It is equipped with the necessary functions for the fabrication and analysis of microstructures as a standard system. With high processing capability and a wide range of applications, it contributes to research and development in applications requiring microstructure fabrication, such as MEMS and micro-optics. 【Features】 ■ For maskless exposure and mask creation ■ 2.5D grayscale exposure mode (standard 128 levels, optional 255 levels or 1000 levels) ■ Versatile with rich features and expandability for multiple applications ■ Switchable up to six drawing modes (0.3um-4.0um) (pixel size) ■ High-precision alignment with backside alignment capability ■ Maximum substrate size supported is 9 inches x 9 inches ■ Compatible with various data formats *For more details, please refer to the catalog or feel free to contact us.

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper
  • Direct imaging equipment

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Laser direct writing device

Laser direct writing device

Achieving ultra-fine high-resolution drawing on the tabletop.

The PICOMASTER series laser direct drawing devices boast high-level high resolution and grayscale in the market. The minimum resolution is 300nm, and it also supports optional resolutions of 600nm and 900nm, allowing for flexible adaptation to customers' design and development needs. ■ Budget Model PICOMASTER Start100 A desktop-sized entry model. CDA is not required (optional; utility is only power, and glovebox integration is also possible). ■ PICOMASTER100, 150, 200 Standard models with a minimum line width of 300nm and alignment accuracy of 250nm. The PICOMASTER100 is a desktop-sized model that supports high-precision drawing. ■ PICOMASTER XF200 A model for mass production and small lot production of devices. It supports a minimum line width of 600nm and alignment accuracy of 250nm, with a maximum drawing speed of 560mm/min.

  • PM100.jpg
  • PM XF200.jpg
  • Other semiconductor manufacturing equipment
  • Electron beam lithography equipment
  • Direct imaging equipment

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Direct Drawing Device "Ledia6"

Direct Drawing Device "Ledia6"

Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.

The "Ledia6" is a direct drawing device that continues to respond to the needs for further high density and high precision of substrates mounted on mobile devices, as well as a wide variety of substrates for automotive electronics, with reliable exposure technology. By freely controlling a three-wavelength light source, it can cover a broader wavelength range necessary for exposure, significantly expanding the types of compatible resists. Additionally, it is equipped with a unique alignment algorithm that corrects substrate distortion, achieving high precision finishing and the highest level of throughput unique to direct drawing devices. 【Features】 ■ UV-LED multi-wavelength exposure ■ Achieves high-quality exposure regardless of the type of resist ■ High-speed alignment ■ Drawing quality suitable for high value-added fields ■ System configuration that can be selected from mass production to prototyping and small lots *For more details, please download the PDF or feel free to contact us.

  • Electron beam lithography equipment
  • Direct imaging equipment

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